Ipc g03f
http://www.jiii.or.jp/chizaiyorozuya/pdf/toukei/krp2024032731.pdf Web8 apr. 2024 · 本发明涉及一种用作光刻胶的感光树脂组合物,特别涉及一种用于光刻胶的感光树脂组合物,该组合物以聚倍半硅氧烷类共聚物为成膜树脂,以二叠氮化物为感光剂, …
Ipc g03f
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WebIPC 8 full level G03F 7/20 (2006.01) CPC (source: EP KR US) G03F 7/704 (2013.01 - KR); G03F 7/70458 (2013.01 - EP KR US); G03F 7/705 (2013.01 - EP KR US); G03F 7/70516 … WebClassification of the application (IPC): G03F 1/70, H01L 21/3065, G03F 1/36 Technical fields searched (IPC): G03F, G06F DOCUMENTS CONSIDERED TO BE RELEVANT …
Web588737172 - EP 3363843 B1 20240412 - RESIN AND PHOTOSENSITIVE RESIN COMPOSITION - [origin: EP3363843A1] A resin and a photosensitive resin composition …
WebPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES (for photomechanical purposes G03F); PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, … WebThe invention discloses a cyclic scanning exposure machine, which relates to the field of optical equipment and solves the problem of low exposure efficiency of the existing …
Web11 sep. 2024 · IPC G03F 7/20 G03F 9/00 Title A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND ASSOCIATED …
Web5 mei 2024 · IPC G03F 7/20 G03F 1/24 G21K 1/06 G02B 1/12 C03C 17/34 C03C 17/36 Title METHOD FOR PRODUCING REFLECTIVE OPTICAL ELEMENTS FOR THE EUV … bison topspeedWebCPC to IPC Concordance for Subclass G03F CPC Group IPC Group G03F 1/00 G03F 1/00 G03F 1/20 G03F 1/20 G03F 1/22 G03F 1/22 G03F 1/24 G03F 1/24 G03F 1/26 G03F 1/26 bison tr86WebIPC (2013.01), Section G 1. G03F 1/90 • prepared by montage processes [2012.01] 1/92 • prepared from printing surfaces [2012.01] 3/00 Colour separation; Correction of tonal … darren knowd durham county councilWebPROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a color filter, which is improved in development durability and contrast, and a pattern forming … bison toyotaWebG03F - Fotomechanisch produceren van getextureerde of gepatroneerde oppervlakken, bijv. voor het afdrukken of voor het bewerken van halfgeleiderinrichtingen; materialen … darren knowles pomonaWeb본 발명은 포토마스크 기판을 강고하게 유지할 수 있고, 포토마스크 기판 수납부의 결로가 억제되고, 청청도가 우수하고, 포토마스크 기판 표면에 먼지(미세 입자)가 부착하기 어렵고, … bison tracksWeb29 jul. 2024 · This resist pattern forming method includes: a step for directly or indirectly applying a radiation-sensitive composition to a substrate; a step for directly or indirectly applying a composition for forming an upper layer film to the resist film formed by the step for applying the radiation-sensitive composition; a step for exposing, to … darren koch cary nc